Effect of substrate temperature on the properties of reactively sputtered TiN/NbN multilayers

Crystal Research and Technology

Volumn 46, Issue 12, 2011, Pages 1273-1282

  Subramanian, B ^a,b   Ananthakumar, R ^a   Jayachandran, M ^a  

^a CENTRAL ELECTROCHEMICAL RESEARCH INSTITUTE   (India)

^b OSAKA UNIVERSITY   (Japan)

Author keywords

magnetron Sputtering; microstructure; multilayers; XRD

Indexed keywords

BAND EMISSION; CHARACTERISTIC PEAKS; CUBIC STRUCTURE; DC REACTIVE MAGNETRON SPUTTERING; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; GLASS SUBSTRATES; GRAIN SIZE; HEXAGONAL STRUCTURES; MULTI-LAYER-COATING; PHOTOLUMINESCENCE MEASUREMENTS; SI (1 1 1); SMOOTH SURFACE; STRUCTURAL AND OPTICAL PROPERTIES; SUBSTRATE TEMPERATURE; VARIOUS SUBSTRATES; WAVELENGTH RANGES; XRD;

COATINGS; FIELD EMISSION MICROSCOPES; FILM PREPARATION; MAGNETRON SPUTTERING; MICROSTRUCTURE; MULTILAYERS; OPTICAL EMISSION SPECTROSCOPY; OPTICAL MULTILAYERS; OPTICAL PROPERTIES; PHOTONS; SCANNING ELECTRON MICROSCOPY; SURFACE MORPHOLOGY; TITANIUM NITRIDE; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

SUBSTRATES;

EID: 81755173953     PISSN: 02321300     EISSN: 15214079     Source Type: Journal    
DOI: 10.1002/crat.201100353     Document Type: Article

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