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Volumn 203, Issue 5-7, 2008, Pages 657-660
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Investigation of the microstructure and characterizations of TiN/CrN nanomultilayer deposited by unbalanced magnetron sputter process
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Author keywords
CrN; Hard coating; Superlattice; TiN; Unbalanced magnetron sputtering
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Indexed keywords
ANNEALING;
CHROMIUM;
CRYSTALS;
ELECTRON ENERGY LEVELS;
FLOW RATE;
HARD COATINGS;
HARDNESS;
LITHIUM COMPOUNDS;
MAGNETRON SPUTTERING;
MAGNETRONS;
MECHANICAL PROPERTIES;
MONOLAYERS;
MULTILAYER FILMS;
MULTILAYERS;
NITROGEN;
SOLIDS;
SUPERLATTICES;
THICK FILMS;
THIN FILM DEVICES;
THIN FILMS;
TIN;
TITANIUM COMPOUNDS;
TITANIUM NITRIDE;
VAPOR DEPOSITION;
APPLIED BIAS VOLTAGES;
COLUMNAR STRUCTURES;
CRITICAL LOADS;
CRN;
CRYSTALLINE STRUCTURES;
DC MAGNETRON SPUTTERING;
DESIRABLE PROPERTIES;
GRAIN SIZES;
MONOLAYER THICKNESSES;
MULTILAYER THIN FILMS;
N TRANSFORMATIONS;
NITROGEN FLOW RATES;
PHASE TRANSFORMATIONS;
SCRATCH TESTS;
SINGLE LAYERS;
THERMAL STABILITIES;
UNBALANCED MAGNETRON SPUTTERING;
UNBALANCED MAGNETRON SPUTTERS;
FILM PREPARATION;
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EID: 55849093910
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/j.surfcoat.2008.05.057 Document Type: Article |
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Times cited : (30)
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References (13)
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