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Volumn 322, Issue 1-2, 1998, Pages 56-62
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Properties of indium tin oxide films prepared by rf reactive magnetron sputtering at different substrate temperature
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Author keywords
Indium tin oxide; Magnetron sputtering; Substrate temperature
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Indexed keywords
CRYSTAL ORIENTATION;
ELECTRIC CONDUCTIVITY MEASUREMENT;
FILM PREPARATION;
HIGH TEMPERATURE EFFECTS;
LIGHT REFLECTION;
MAGNETRON SPUTTERING;
OPACITY;
SCANNING ELECTRON MICROSCOPY;
SEMICONDUCTING GLASS;
SEMICONDUCTING INDIUM COMPOUNDS;
SUBSTRATES;
X RAY CRYSTALLOGRAPHY;
DIFFRACTION PEAKS;
INDIUM TIN OXIDE (ITO) FILMS;
SEMICONDUCTING FILMS;
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EID: 0032496535
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(97)00939-5 Document Type: Article |
Times cited : (160)
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References (21)
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