Influence of substrate temperature on the properties of indium oxide thin films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 3, 2000, Pages 814-818

  Adurodija, F O ^a   Izumi, H ^a   Ishihara, T ^a   Yoshioka, H ^a   Motoyama, M ^a   Murai, K ^b  

^a Hyogo Prefectural Institute of Industrial Research Technical Center for Machinery and Metals   (Japan)

^b OSAKA NATIONAL RESEARCH INSTITUTE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; DEPOSITION; ELECTRIC CONDUCTIVITY OF SOLIDS; GLASS; HALL EFFECT; PULSED LASER APPLICATIONS; SEMICONDUCTING INDIUM COMPOUNDS; SEMICONDUCTOR DOPING; SUBSTRATES; THERMAL EFFECTS; THIN FILMS; TIN COMPOUNDS;

INDIUM OXIDE; PULSED LASER DEPOSITION (PLD);

SEMICONDUCTING FILMS;

EID: 0034186881     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582260     Document Type: Article

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