The influence of pulsed magnetron sputtering on topography and crystallinity of TiO2 films on glass

Surface and Coatings Technology

Volumn 123, Issue 2-3, 2000, Pages 268-272

  Treichel, O ^a   Kirchhoff, V ^a  

^a Fraunhofer Institute for Electron Beam and Plasma Technology   (Germany)

Author keywords

Atomic force microscopy; Pulse magnetron sputtering; Titanium oxide; X ray diffraction

Indexed keywords

ATOMIC FORCE MICROSCOPY; INTERFACIAL ENERGY; MAGNETRON SPUTTERING; NUCLEATION; OPTICAL FILMS; SPUTTER DEPOSITION; SUBSTRATES; SURFACE TOPOGRAPHY; THERMAL EFFECTS; TITANIUM DIOXIDE; X RAY DIFFRACTION ANALYSIS;

PULSE MAGNETRON SPUTTERING;

OPTICAL COATINGS;

EID: 0033878276     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00522-8     Document Type: Article

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