Chalcogenide glass e-beam and photoresists for ultrathin grayscale patterning

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 8, Issue 4, 2009, Pages

  Kovalskiy, Andriy ^a   Cech, Jiri ^a   Vlcek, Miroslav ^b   Waits, Christopher M ^c   Dubey, Madan ^c   Heffner, William R ^a   Jain, Himanshu ^a  

^a LEHIGH UNIVERSITY   (United States)

^b UNIVERSITY OF PARDUBICE   (Czech Republic)

^c U S ARMY RESEARCH LABORATORY   (United States)

Author keywords

Contact hole imaging; Inverse lithography; Mask write time; Model based assist features

Indexed keywords

GLASS; LITHOGRAPHY; MEMS; MICROELECTROMECHANICAL DEVICES; OPTICAL INSTRUMENT LENSES; PHASE CHANGE MEMORY; REACTIVE ION ETCHING; SUBSTRATES; ULTRATHIN FILMS;

ASSIST FEATURES; CHALCOGENIDE GLASS; CONTACT HOLE IMAGING; ETCH MASK; ETCH SELECTIVITY; ETCHED PATTERNS; ETCHING RATIO; FRESNEL LENS; GRAY SCALE; GRAY-SCALE LITHOGRAPHY; HIGH RESOLUTION; INVERSE LITHOGRAPHY; MASK WRITE TIME; OPTICAL FUNCTIONALITIES; SILICON SUBSTRATES; ULTRA-THIN;

PHOTORESISTS;

EID: 80055064928     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.3273966     Document Type: Article

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