Development of a deep silicon phase fresnel lens using gray-scale lithography and deep reactive ion etching

Journal of Microelectromechanical Systems

Volumn 13, Issue 1, 2004, Pages 113-120

  Morgan, Brian ^a   Waits, Christopher M ^a   Krizmanic, John ^b   Ghodssi, Reza ^a  

^a UNIVERSITY OF MARYLAND   (United States)

^b UNIVERSITIES SPACE RESEARCH ASSOCIATION   (United States)

Author keywords

Deep reactive ion etching (DRIE); Gray scale lithography; Phase Fresnel lens (PFL); Three dimensional (3 D) structures

Indexed keywords

APPROXIMATION THEORY; COMPUTER AIDED DESIGN; MASKS; PHOTOLITHOGRAPHY; REACTIVE ION ETCHING; SILICON WAFERS;

DEEP REACTIVE ION ETCHING; GRAY SCALE LITHOGRAPHY; PHASE FRESNEL LENS;

MICROLENSES;

EID: 1542709507     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2003.823220     Document Type: Article

References (28)

1. (2003, July 24). [Online]. Available: http://sci.esa.int/integral/visited
2. G. Skinner, "Diffractive/refractive optics for high energy astronomy I. Gamma-ray phase Fresnel lenses," Astronomy and Astrophys., vol. 375, pp. 691-700, 2001.
3. G. Skinner, P. von Ballmoos, H. Halloin, N. Gehrels, and J. Krizmanic, "Diffraction-limited gamma-ray imaging with Fresnel lenses," in Proc. SPIE v.4851, X-Ray and Gamma-Ray Telescopes and Instruments for Astronomy, J. E. Truemper and H. D. Tananbaum, Eds., 2002.
4. NASA GSFC Integrated Mission Design Center (IMDC) Study, 2002.
5. M. R. Whitley, R. L. Clark, J. R. Shaw, D. R. Brown, P. S. Erbach, and G. T. Dorek, "Int. Patent," WO 02/31 600 A1, 2002.
6. R. B. GmbH, "U.S. Patent," 5 501 893, 1996.
7. J. Shimada, O. Ohguchi, and R. Sawada, "Microlens fabricated by the planar process," J. Lightwave Technol., vol. 9, pp. 571-576, May 1991.
8. E.-H. Park, M.-J. Kim, and Y.-S. Kwon, "Microlens for efficient coupling between LED and optical fiber," IEEE Photon. Technol. Lett., vol. 11, pp. 439-441, Apr. 1999.
9. C. David, B. Nohammer, and E. Ziegler, "Wavelength tunable diffractive transmission lenses for hard x-rays," Appl. Phys. Lett., vol. 79, no. 8, pp. 1088-90, Aug. 2001.
10. L. Y. Lin, S. S. Lee, K. S. J. Pister, and M. C. Wu, "Micro-machined three-dimensional micro-optics for integrated free-space optical system," IEEE Photon. Technol. Lett., vol. 6, pp. 1445-1447, 1994.
11. M. J. Zwanenburg et al., Phys. Rev. Lett., vol. 85, p. 5154, 2000.
12. Y. Li et al., "Characterizing the hard x-ray diffraction properties of a GaAs linear Bragg-Fresnel lens," Appl. Phys. Lett., vol. 77, no. 3, pp. 313-315, July 2000.
13. E. Di Fabrizio and M. Gentili, "X-ray multilevel zone plate fabrication by means of electron-beam lithography: Toward high-efficiency performances," J. Vac. Sci. Technol. B, vol. 17, no. 6, pp. 3439-3443, Nov./Dec. 1999.
14. E. DiFabrizio, F. Romanato, M. Gentili, R. Gabrini, R. Kaulich, J. Susini, and R. Barrett, "High efficiency multilevel zone plates for keV X-rays," Nature, vol. 401, October 1999.
15. S. Spector, C. J. Jacobsen, and D. M. Tennant, "Process optimization for production of sub-20 nm soft x-ray zone plates," J. Vac. Sci. Technol. B, vol. 15, no. 6, pp. 2872-2876, Nov./Dec. 1997.
16. Z. Chen et al., "Design and fabrication of Fresnel zone plates with large numbers of zones," J. Vac. Sci. Technol. B, vol. 15, no. 6, pp. 2522-2527, Nov./Dec. 1997.
17. C. David and A. Souvorov, "High-efficiency Bragg-Fresnel lenses with 100 nm outermost zone width," Rev. Scientif. Instrum., vol. 70, no. 11, pp. 4168-4173, Nov. 1999.
18. C. M. Waits, A. Modafe, and R. Ghodssi, "Investigation of gray scale technology for large area 3D silicon MEMS structures," J. Micromech. Microeng., vol. 13, pp. 170-177, 2003.
19. Canyon Materials Inc., "U.S. Patent," 5 285 517, 1994.
20. W. Daschner, R. Stein, P. Long, C. Wu, and S. H. Lee, "1996 one-step lithography for mass production of multilevel diffractive optical elements using high energy beam sensitive (HEBS) gray-level mask," in Proc. SPIE: Diffractive and Holographic Optics Technology III, 2689, pp. 153-155.
21. Gal, "U.S. Patent," 5 310 623, 1994.
22. E. Hecht and A. Zajac, OPTICS. Reading, MA: Addison-Wesley, 1974, p. 375.
23. B. Hadimioglu, E. G. Rawson, R. Lujan, M. Lim, J. C. Zesch, B. T. Khuri-Yakub, and C. F. Quate, "High-Efficiency Fresnel acoustic lenses," in 1993 Ultrasonics Symp., pp. 579-582.
24. J. R. Leger, M. L. Scott, P. Bundman, and M. P. Griswold, "Astigmatic wavefront correction of gain-guided laser diode array using anamorphic diffractive microlenses," in Proc. SPIE, vol. 884, 1988, p. 82.
25. B. H. Kleemann and R. Guther, "Zonal diffraction efficiencies and imaging of micro-Fresnel lenses," J. Modern Opt., vol. 45, no. 7, pp. 1405-1420, 1998.
26. M. Kuittinen, H. P. Herzig, and P. Ehbets, "Improvements in diffraction efficiency of gratings and microlenses with continuous relief structures," Opt. Commun., vol. 120, pp. 230-234, 1995.
27. C. M. Waits, B. Morgan, M. Kastantin, and R. Ghodssi, "Microfabrication of 3-D silicon structures using gray-scale lithography and deep reactive ion etching," Sensors and Actuators A: Physical, submitted for publication.
28. A. Ayon, R. Braff, C. Lin, and H. Sawin, "Characterization of a time multiplexed inductively coupled plasma etcher," J. Electrochem. Soc., vol. 146, no. 1, pp. 339-49, Jan. 1999.