Dry-etch of As2S3 thin films for optical waveguide fabrication

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 23, Issue 6, 2005, Pages 1626-1632

  Li, Weitang ^a   Ruan, Yinlan ^a   Luther Davies, Barry ^a   Rode, Andrei ^a   Boswell, Rod ^a  

^a AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

ARSENIC COMPOUNDS; LANGMUIR BLODGETT FILMS; OPTICAL WAVEGUIDES; SPUTTERING; SURFACE ROUGHNESS; THIN FILMS;

HELICON PLASMA ETCHER; OPTICAL SPECTROSCOPY;

PLASMA ETCHING;

EID: 31044448037     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2049308     Document Type: Article

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