Shallow Fresnel lens fabrication using grey scale lithography made by high energy beam sensitive mask (HEBS) technology and reactive ion etching

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7205, Issue , 2009, Pages

  Nachmias, Tali ^a   Ohayon, Avi ^a   Melzer, Shefer E ^a   Kabla, Meni ^a   Louzon, Elie ^a   Levy, Uriel ^b  

^a Rafael Advanced Defense Systems Ltd   (Israel)

^b HEBREW UNIVERSITY OF JERUSALEM   (Israel)

Author keywords

Deep reactive ion etching (DRIE); Design of experiment (DOE).; Fresnel lens; Gray scale lithography (GSL); High energy beam sensitive (HEBS) glass; Reactive ion etching (RIE)

Indexed keywords

DEEP REACTIVE ION ETCHING (DRIE); DESIGN OF EXPERIMENT (DOE).; FRESNEL LENS; GRAY SCALE LITHOGRAPHY (GSL); HIGH ENERGY BEAM SENSITIVE (HEBS) GLASS; REACTIVE ION ETCHING (RIE);

DENSITY (OPTICAL); DESIGN OF EXPERIMENTS; DIFFRACTIVE OPTICAL ELEMENTS; ELECTRON BEAM LITHOGRAPHY; EXPERIMENTS; FABRICATION; GLASS; IONS; OPTICAL INSTRUMENT LENSES; PHOTORESISTORS; SURFACE TREATMENT;

REACTIVE ION ETCHING;

EID: 65349159332     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.809376     Document Type: Conference Paper

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