Continuous profile writing by electron and optical lithography

Microelectronic Engineering

Volumn 34, Issue 3-4, 1997, Pages 261-298

  Kley, Ernst Bernhard ^a  

^a FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; LASER BEAM EFFECTS; MASKS; OPTICS; PHOTOLITHOGRAPHY;

DIFFRACTIVE OPTICS; ELECTRON BEAM WRITING; LASER BEAM WRITING; OPTICAL HALF TONE MASK TECHNOLOGY; SURFACE PROFILING TECHNIQUES;

OPTICAL DESIGN;

EID: 0031389573     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(97)00186-X     Document Type: Article

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