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Volumn 130, Issue 1-2, 2011, Pages 147-153

Effect of deposition temperature on microstructure and corrosion resistance of ZrN thin films deposited by DC reactive magnetron sputtering

(9) Roman, Daiane a Bernardi, Juliane a Amorim, Cintia L G De a De Souza, Fernando S c Spinelli, Almir c Giacomelli, Cristiano d Figueroa, Carlos A a Baumvol, Israel J R a,b Basso, Rodrigo L O a

a UNIVERSITY OF CAXIAS DO SUL (Brazil)

b FEDERAL UNIVERSITY OF RIO GRANDE DO SUL (Brazil)

c FEDERAL UNIVERSITY OF SANTA CATARINA (Brazil)

d FEDERAL UNIVERSITY OF SANTA MARIA (Brazil)

Author keywords

Strain energy; Zirconium nitride; Zirconium oxynitride; ZrN thin films

Indexed keywords

ARTIFICIAL SALIVA; BRAGG PEAKS; CHEMICAL STATE; CORROSION BEHAVIOR; CRYSTALLINE STRUCTURE; CRYSTALLOGRAPHIC PLANE; DC REACTIVE MAGNETRON SPUTTERING; DEPOSITION TEMPERATURES; DEPOSITION TIME; DIFFERENT SUBSTRATES; DIRECT CURRENT; GLANCING ANGLE X-RAY DIFFRACTIONS; HIGH TEXTURE; PARTIAL PRESSURE RATIO; PITTING POTENTIAL; POTENTIAL RANGE; POTENTIODYNAMIC POLARIZATION TESTS; REACTIVE MAGNETRON SPUTTERING; RUTHERFORD BACK-SCATTERING SPECTROMETRY; SUBSTRATE TEMPERATURE; TOP SURFACE; X-RAY DIFFRACTION MEASUREMENTS; XPS ANALYSIS; ZIRCONIUM NITRIDE; ZRN FILMS; ZRN THIN FILMS;

CHEMICAL ANALYSIS; CORROSION RESISTANCE; DIFFRACTION; ELECTROLYTIC CELLS; NITRIDES; PHOTOELECTRON SPECTROSCOPY; PITTING; PRESSURE EFFECTS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; THIN FILMS; VAPOR DEPOSITION; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY; ZIRCONIUM; ZIRCONIUM ALLOYS;

DEPOSITION;

EID: 80052563325 PISSN: 02540584 EISSN: None Source Type: Journal
DOI: 10.1016/j.matchemphys.2011.06.013 Document Type: Article

Times cited : (85)

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