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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 29, Issue 5, 2011, Pages

Optimized growth of Ge nanorod arrays on Si patterns

(5) Khare, C a Fuhrmann, B b Leipner, H S b Bauer, J a Rauschenbach, B a

a LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM (Germany)

b MARTIN LUTHER UNIVERSITY HALLE WITTENBERG (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COLUMN COMPETITION; GLANCING ANGLE DEPOSITION; MULTIPLE STRUCTURES; NANOROD ARRAYS; NANOROD GROWTH; SEPARATION DISTANCES; SI SEED; SI SUBSTRATES; SYSTEMATIC VARIATION;

GERMANIUM; NANORODS; OPTIMIZATION; POLYSTYRENES; REACTIVE ION ETCHING;

SILICON;

EID: 80052407876 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.3607409 Document Type: Article

Times cited : (13)

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