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Volumn 17, Issue 5, 2006, Pages 1339-1343

Fabrication of nanopillars by nanosphere lithography

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; MASKS; NANOSTRUCTURED MATERIALS; REACTIVE ION ETCHING; SEMICONDUCTOR MATERIALS;

EID: 33144470243     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/17/5/028     Document Type: Article
Times cited : (266)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.