Influence of substrate temperature on glancing angle deposited Ag nanorods

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 28, Issue 4, 2010, Pages 1002-1009

  Khare, C ^a   Patzig, C ^a   Gerlach, J W ^a   Rauschenbach, B ^a   Fuhrmann, B ^b  

^a LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM   (Germany)

^b MARTIN LUTHER UNIVERSITY HALLE WITTENBERG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AG NANORODS; ARTIFICIAL SEEDS; BEAM DIVERGENCE; COLUMNAR STRUCTURES; CRYSTALLINE NANORODS; CRYSTALLINE STRUCTURE; DEPOSITED FILMS; ELEVATED TEMPERATURE; ENHANCED SURFACE; GLANCING ANGLE; GLANCING ANGLE DEPOSITION; HIGH TEMPERATURE; IN-BETWEEN; INCIDENT PARTICLES; ION-BEAM SPUTTERING; PARTICLE FLUXES; PATTERN PERIOD; PATTERNED SUBSTRATES; POLYCRYSTALLINE; ROOM TEMPERATURE; SCULPTURED THIN FILMS; SEED POINT; SI SUBSTRATES; SILICON SUBSTRATES; SLIT APERTURES; SUBSTRATE TEMPERATURE; X-RAY DIFFRACTION MEASUREMENTS;

CRYSTAL ORIENTATION; CRYSTALLINE MATERIALS; DEPOSITION; EPITAXIAL FILMS; NANORODS; SILVER; SPUTTERING; X RAY DIFFRACTION;

SUBSTRATES;

EID: 77954202510     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3447231     Document Type: Conference Paper

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