Glancing angle sputter deposited nanostructures on rotating substrates: Experiments and simulations

Journal of Applied Physics

Volumn 104, Issue 9, 2008, Pages

  Patzig, C ^a   Karabacak, T ^b   Fuhrmann, B ^c   Rauschenbach, B ^a,d  

^a LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM   (Germany)

^b UNIVERSITY OF ARKANSAS AT LITTLE ROCK   (United States)

^c MARTIN LUTHER UNIVERSITY HALLE WITTENBERG   (Germany)

^d UNIVERSITY OF LEIPZIG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; HONEYCOMB STRUCTURES; ION BOMBARDMENT; LITHOGRAPHY; MONTE CARLO METHODS; NANOSTRUCTURES; ROTATION; SILICON; SURFACE DIFFUSION; THREE DIMENSIONAL;

CONTINUOUS FILMS; DENSE FILMS; DEPOSITION ANGLES; GLANCING ANGLE DEPOSITIONS; GLANCING ANGLES; GROWING FILMS; HONEYCOMB TEMPLATES; INCIDENT FLUXES; ION BEAM SPUTTERS; MONTE CARLO SIMULATIONS; NANOSPHERE LITHOGRAPHIES; NORMAL INCIDENCES; OBLIQUE ANGLES; ORDERED ARRAYS; RODLIKE STRUCTURES; ROTATING SUBSTRATES; ROTATIONAL SPEEDS; SI FILMS; STRUCTURAL EVOLUTIONS; TRIANGULAR CROSS SECTIONS;

SUBSTRATES;

EID: 56349129749     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3018145     Document Type: Article

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