Silicon nanocolumns on nanosphere lithography templated substrates: Effects of sphere size and substrate temperature

Journal of Nanoscience and Nanotechnology

Volumn 9, Issue 3, 2009, Pages 1985-1991

  Patzig, Christian ^a   Fuhrmann, Bodo ^b   S Leipner, Hartmut ^b   Rauschenbach, Bernd ^a  

^a LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM   (Germany)

^b MARTIN LUTHER UNIVERSITY HALLE WITTENBERG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COLUMN HEIGHT; CROSS-SECTIONAL SCANNING ELECTRON MICROSCOPIES; DIFFUSION EFFECTS; ELEVATED TEMPERATURE; GLANCING ANGLE; HEMISPHERICAL CAP; ION BEAM SPUTTER DEPOSITION; NANO SPHERE LITHOGRAPHY; NANO-COLUMNS; PATTERNED SUBSTRATES; REGULAR ARRAY; ROOM TEMPERATURE; SPHERE DIAMETER; SUBSTRATE TEMPERATURE; TEMPLATED SUBSTRATES;

MERGING; NANOSPHERES; POLYSTYRENES; SCANNING ELECTRON MICROSCOPY; SILICON; SILICON COMPOUNDS; SILICON OXIDES; SPHERES;

SUBSTRATES;

EID: 67649222620     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2009.367     Document Type: Conference Paper

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