Direct metal transfer lithography for fabricating wire-grid polarizer on flexible plastic substrate

Journal of Microelectromechanical Systems

Volumn 20, Issue 4, 2011, Pages 916-921

  Chen, Chun Hung ^a   Yu, Te Hui ^a,b   Lee, Yung Chun ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^b Gintech Energy Copporation   (Taiwan)

Author keywords

Direct metal contact printing method; infrared (IR); metallic wire grid polarizers; numerical simulation

Indexed keywords

CONTACT PRESSURES; DIRECT METAL TRANSFER; FLEXIBLE PLASTIC SUBSTRATES; HEATING TEMPERATURES; LINEAR GRATINGS; METAL CONTACTS; METAL PATTERNS; NEAR-IR; OPTICAL CHARACTERISTICS; OPTICAL PERFORMANCE; PET SUBSTRATE; POLYETHYLENE TEREPHTALATE; POTENTIAL APPLICATIONS; ROLLER PRESSING; SILICON MOLDS; SOFT PLASTICS; THEORETICAL SIMULATION; WIRE GRID POLARIZERS;

COMPUTER SIMULATION; HEATING; LITHOGRAPHY; METALS; OPTICAL INSTRUMENTS; PRINTING; REACTIVE ION ETCHING; SUBSTRATES; WIRE;

METAL PRESSING;

EID: 79961209721     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2011.2160046     Document Type: Article

References (26)

1. H. Lee, S. Hong, K. Yang, and K. Choi, "Fabrication of nano-sized resist patterns on flexible plastic film using thermal curing nano-imprint lithography," Microelectron. Eng., vol. 83, no. 2, pp. 323-327, Feb. 2006. (Pubitemid 43199295)
2. H. Lee, S. Hong, K. Yang, and K. Choi, "Fabrication of 100 nm metal lines on flexible plastic substrate using ultraviolet curing nanoimprint lithography," Appl. Phys. Lett., vol. 88, no. 14, p. 143 112, Apr. 2006.
3. S. Y. Hwang, H. Y. Jung, J. H. Jeong, and H. Lee, "Fabrication of nanosized metal patterns on flexible polyethylene-terephthalate substrate using bi-layer nanoimprint lithography," Thin Solid Films, vol. 517, no. 14, pp. 4104-4107, May 2009.
4. S. Y. Chou, P. R. Krauss, and P. J. Renstrom, "Imprint lithography with 25-nanometer resolution," Science, vol. 272, no. 5258, pp. 85-87, Apr. 1996. (Pubitemid 126554924)
5. S. Y. Chou and P. R. Krauss, "Imprint lithography with sub-10 nm feature size high throughput," Microelectron. Eng., vol. 35, no. 1-4, pp. 237-240, Mar. 1997. (Pubitemid 127367124)
6. L. Guo, P. R. Krauss, and S. Y. Chou, "Nano scale silicon field transistor fabricated using imprint lithography," Appl. Phys. Lett., vol. 71, no. 13, pp. 1881-1883, Sep. 1997. (Pubitemid 127638836)
7. W. Zhang and S. Y. Chou, "Fabrication of 60-nm transistors on 4-in. wafer using nanoimprint at all lithography levels," Appl. Phys. Lett., vol. 83, no. 8, pp. 1632-1634, Aug. 2003.
8. M. Colburn, S. Johnson, M. Stewart, S. Damle, T. Bailey, B. Choi, M. Wedlake, T. Michaelson, S. V. Sreenivasan, J. Ekerdt, and C. G. Willson, "Step and flash imprint lithography: A new approach to high-resolution patterning," in Proc. SPIE, 1999, pp. 379-389.
9. M. D. Stewart, S. C. Johnson, S. V. Sreenivasan, D. J. Resnick, and C. G. Willson, "Nanofabrication with step and flash imprint lithography," J. Microlith., Microfab. Microsyst., vol. 4, no. 1, pp. 011 001-011 006, Mar. 2005.
10. Y. Xia and G. M. Whitesides, "Soft lithography," Angew. Chem. Int. Ed., vol. 37, pp. 550-575, 1998.
11. Y. Xia, M. Mrksich, E. Kim, and G. M. Whitesides, "Microcontact printing of octadecylsiloxane on the surface of silicon dioxide and its application in microfabrication," J. Amer. Chem. Soc., vol. 117, no. 37, pp. 9576-9577, Sep. 1995.
12. C. H. Chen, T. H. Yu, and Y. C. Lee, "Direct patterning of metallic micro/nano-structures on flexible polymer substrates by roller-based contact printing and infrared heating," J. Micromech. Microeng., vol. 20, no. 2, p. 025 034, Feb. 2010.
13. S. H. Kim, J. D. Park, and K. D. Lee, "Fabrication of a nano-wire grid polarizer for brightness enhancement in liquid crystal display," Nanotechnology, vol. 17, no. 17, pp. 4436-4438, Sep. 2006.
14. S. Henke, D. Karstädt, K. P. Möllmann, F. Pinno, and M. Vollmer, "Identification and suppression of thermal reflections in infrared thermal imaging," in Proc. Inframation, Las Vegas, NV, 2004, pp. 287-298.
15. L. Zhang, C. Li, J. Li, F. Zhang, and L. Shi, "Design and fabrication of metal-wire nanograting used as polarizing beam splitter in optical telecommunication," J. Optoelectron. Adv. Mater., vol. 8, pp. 847-850, 2006. (Pubitemid 43759994)
16. J. H. Lee, Y. W. Song, J. G. Lee, J. Ha, K. H. Hwang, and D. S. Zang, "Optically bifacial thin-film wire-grid polarizers with nano-patterns of a graded metal-dielectric composite layer," Opt. Express, vol. 16, no. 21, pp. 16 867-16 876, Oct. 2008.
17. K. W. Chien and H. P. D. Shieh, "Design and fabrication of an integrated polarized light guide for liquid-crystal-display illumination," Appl. Opt., vol. 43, no. 9, pp. 1830-1834, Mar. 2004.
18. Y. Ekinci, H. H. Solak, C. David, and H. Sigg, "Bilayer Al wire-grids as broadband and high-performance polarizers," Opt. Exp., vol. 14, no. 6, pp. 2323-2334, Mar. 2006.
19. K. W. Sun, S. C. Huang, A. Kechiantz, and C. P. Lee, "Subwavelength gratings fabricated on semiconductor substrates via E-beam lithography and lift-off method," Opt. Quantum Electron., vol. 37, no. 4, pp. 425-432, Mar. 2005. (Pubitemid 40878823)
20. S. H. Ahn, J. S. Kim, and L. J. Guo, "Bilayer metal wire-grid polarizer fabricated by roll-to-roll nanoimprint lithography on flexible plastic substrate," J. Vac. Sci. Technol. B, Microelectron. Process. Phenom., vol. 25, no. 6, pp. 2388-2391, Nov. 2007. (Pubitemid 350258478)
21. L. Chen, J. J. Wang, F. Walters, X. Deng, M. Buonanno, S. Tai, and X. Liu, "Large flexible nanowire grid visible polarizer made by nanoimprint lithography," Appl. Phys. Lett., vol. 90, no. 6, p. 063 111, Feb. 2007.
22. S. H. Ahn and L. J. Guo, "High-speed roll-to-roll nanoimprint lithography on flexible plastic substrates," Adv. Mater., vol. 20, no. 11, pp. 2044-2049, Jun. 2008.
23. G. Y. Jung, Z. Li, W. Wu, Y. Chen, D. L. Olynick, S. Y. Wang, W. M. Tong, and R. S. Williams, "Vapor-phase self-assembled monolayer for improved mold release in nanoimprint lithography," Langmuir, vol. 21, no. 4, pp. 1158-1161, Feb. 2005. (Pubitemid 40275046)
24. M. Beck, M. Graczyk, I. Maximov, E. L. Sarwe, T. G. I. Ling, M. Keil, and L. Montelius, "Improving stamps for the 10 nm level wafer scale nanoimprint lithography," Microelectron. Eng., vol. 61/62, pp. 441-448, Jul. 2002. (Pubitemid 34613399)
25. L. Vriens andW. Rippens, "Optical constants of absorbing thin solid films on a substrate," Appl. Opt., vol. 22, no. 24, pp. 4105-4110, Dec. 1983. (Pubitemid 14588917)
26. D. Hansen, E. Gardner, R. Perkins, M. Lines, and A. Robbins, "The display applications and physics of the ProFlux wire grid polarizer," in SID Symp. Dig. Tech. Papers, 2002, vol. 33, pp. 730-733.