Optical, electrical and mechanical properties of the tantalum oxynitride thin films deposited by pulsing reactive gas sputtering

Thin Solid Films

Volumn 515, Issue 3, 2006, Pages 952-956

  Le Dreo H ^a   Banakh, O ^a   Keppner, H ^a   Steinmann, P A ^a   Briand, D ^b   de Rooij, N F ^b  

^a University of Applied Sciences   (Switzerland)

^b UNIVERSITY OF NEUCHÂTEL   (Switzerland)

Author keywords

Magnetron sputtering; Tantalum oxynitrides

Indexed keywords

COMPOSITION; ELECTRIC PROPERTIES; LIGHT TRANSMISSION; MECHANICAL PROPERTIES; OPTICAL PROPERTIES; SPUTTER DEPOSITION; TANTALUM COMPOUNDS; X RAY DIFFRACTION;

CAPACITANCE VOLTAGE MEASUREMENTS; OPTICAL TRANSMISSION SPECTRA; REACTIVE GAS SPUTTERING; TANTALUM OXYNITRIDES;

THIN FILMS;

EID: 33750452704     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.07.054     Document Type: Article

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