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Volumn 200, Issue 1-4 SPEC. ISS., 2005, Pages 341-345

Optical and electronic properties of CrOxNy films, deposited by reactive DC magnetron sputtering in Ar/N2 /O2(N2O) atmospheres

(3) Mientus, R b Grotschel R c Ellmer, K a

a HAHN MEITNER INSTITUT (Germany)

b Optotransmitter Umweltschutz T (Germany)

c INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH (Germany)

Author keywords

Chromium nitride; Chromium oxide; Discharge characteristics; Electronic properties; Reactive magnetron sputtering

Indexed keywords

ATMOSPHERIC COMPOSITION; COMPOSITION EFFECTS; ELECTRONIC PROPERTIES; FILMS; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; OPTICAL PROPERTIES; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SPUTTER DEPOSITION; STOICHIOMETRY; X RAY DIFFRACTION ANALYSIS;

CHROMIUM NITRIDE; CHROMIUM OXIDE; CHROMIUM OXYNITRIDE FILMS; DISCHARGE CHARACTERISTICS; GAS COMPOSITION; REACTIVE MAGNETRON SPUTTERING;

CHROMATE COATINGS;

COATING;

EID: 24644498528 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2005.02.181 Document Type: Article

Times cited : (36)

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