On the existence of superstructure in TiNx thin films

Thin Solid Films

Volumn 441, Issue 1-2, 2003, Pages 135-139

  Zerkout, S ^c   Achour, S ^c   Mosser, A ^a   Tabet, N ^b  

^a INSTITUT DE PHYSIQUE ET CHIMIE DES MATÉRIAUX DE STRASBOURG   (France)

^b Department of Physics   (Saudi Arabia)

^c NONE

Author keywords

Annealing; HRTEM; Superstructure; Ti3N 4; TiNx; XPS

Indexed keywords

HIGH RESOLUTION ELECTRON MICROSCOPY; MAGNETRON SPUTTERING; SINGLE CRYSTALS; TITANIUM NITRIDE; TRANSMISSION ELECTRON MICROSCOPY;

SUPERSTRUCTURE;

THIN FILMS;

EID: 0041508223     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00850-2     Document Type: Article

References (16)

1. Lemperiere G., Poitevin J.M. Thin Solid Films. 111:1984;339.
2. Toth L.E. Transition Metal Carbides and Nitrides. 1971;Academic Press, New York.
3. Porte J.L., Roux L., Hanus J. Phys. Rev. B8:1983;3214.
4. Manory R.R., Kimmel G. Surf. Coat. Technol. 63:1994;85.
5. Elstner F., Ehrlich A., Giegengack H., Kupfer H., Richter F. J. Vac. Sci. Technol. A12:1994;476.
6. Perry A.J. J. Vac. Sci. Technol. A. 6:1988;2140.
7. Schaffer J.P., Perry A.J., Brunner J. J. Vac. Sci. Technol. A. 10:1992;193.
8. Bendavid A., Martin J.P., Netterfield R.P., Kinder T.J. Surf. Interface Anal. 24:1996;627.
9. Logothetidis S., Meletis E., Kourouklis G. J. Mater. Res. 14:1999;436.
10. Prieto P., Kirby R.E. J. Vac. Sci. Technol. A. 13:1995;2819.
11. Lu F.-H., Chen H.-Y. Surf. Coat. Technol. 130:2000;290.
12. Esaka F., Furuya K., Shimada H., et al. J. Vac. Sci. Technol. A. 15:1997;2521.
13. Kim C.W., Kim K.H. Thin Solid Films. 307:1997;113.
14. Johansson B.O., Hentzell H.T.G., Harper J.M.E., Cuomo J.J. J. Mater. Res. 1:1986;442.
15. Yee D.S., Cuomo J.J., Frisch M.A., Smith D.P.E. J. Vac. Sci. Technol. A4:1986;381.
16. Schwarz K., Williams A.R., Cuomo J.J., Harper J.M.E., Hentzell H.T.G. Phys. Rev. B32:1985;8312.