Properties of Ti1-xSixNy films deposited by concurrent cathodic arc evaporation and magnetron sputtering

Surface and Coatings Technology

Volumn 163-164, Issue , 2003, Pages 245-250

  Martin, P J ^a   Bendavid, A ^a  

^a CSIRO   (Australia)

Author keywords

Arc evaporation; Hardness; Nano composite

Indexed keywords

COMPRESSIVE STRESS; MAGNETRON SPUTTERING; MICROHARDNESS; SYNTHESIS (CHEMICAL); THIN FILMS;

MAGNETRON SPUTTER SOURCES;

PROTECTIVE COATINGS;

COMPOSITE; EVAPORATION; HARDNESS; INORGANIC COATING; SPUTTERING;

EID: 0037472783     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(02)00491-7     Document Type: Article

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