SCOPUS 정보 검색 플랫폼

Surface and Coatings Technology

Volumn 193, Issue 1-3 SPEC. ISS., 2005, Pages 345-349

Structure and properties of Ti-Si-N films prepared by ICP assisted magnetron sputtering

(6) Li, Z G a,d Mori, M a Miyake, S a Kumagai, M b Saito, H c Muramatsu, Y c

a OSAKA UNIVERSITY (Japan)

b KANAGAWA ACADEMY OF SCIENCE AND TECHNOLOGY (Japan)

c Kanagawa High Technology Foundation (Japan)

d SHANGHAI JIAO TONG UNIVERSITY (China)

Author keywords

Hardness; Inductively coupled plasma; Nanocomposite film; Sputtering

Indexed keywords

AMORPHOUS MATERIALS; CRYSTALLINE MATERIALS; INDUCTIVELY COUPLED PLASMA; ION BOMBARDMENT; NANOSTRUCTURED MATERIALS; SILICON NITRIDE; THERMAL EFFECTS; THIN FILMS; TITANIUM NITRIDE; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

COLUMN BOUNDARIES; ION FLUX; LOW DEPOSITION TEMPERATURE; NANOCOMPOSITE EFFECTS;

MAGNETRON SPUTTERING;

COATING;

EID: 13844296365 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2004.08.148 Document Type: Article

Times cited : (39)

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