Temperature dependent in situ doping of ALD ZnO

Journal of Thermal Analysis and Calorimetry

Volumn 105, Issue 1, 2011, Pages 93-99

  Baji, Zs ^a   Labadi Z ^a   Horvath Z E ^a   Fried, M ^a   Szentpali B ^a   Barsony I ^a  

^a RESEARCH INSTITUTE FOR TECHNICAL PHYSICS AND MATERIALS SCIENCE   (Hungary)

Author keywords

Aluminium doping; Atomic layer deposition; Transparent conductive oxide; ZnO

Indexed keywords

AL CONTENT; ATOMIC LAYER; CRYSTALLINE MORPHOLOGIES; IN-SITU DOPING; LAYER DEPOSITION; OPTIMAL DOPING; PULSE METHODS; SYSTEMATIC STUDY; TEMPERATURE DEPENDENT; TRANSPARENT CONDUCTIVE OXIDES; ZNO; ZNO LAYERS;

ALUMINUM; ATOMIC LAYER DEPOSITION;

ZINC OXIDE;

EID: 79959380632     PISSN: 13886150     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10973-011-1641-3     Document Type: Article

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