Thermogravimetric study of volatile precursors for chemical thin film deposition. Estimation of vapor pressures and source temperatures

Journal of Thermal Analysis and Calorimetry

Volumn 64, Issue 3, 2001, Pages 955-964

  Niskanen, A ^a   Hatanpaa T ^a   Ritala, M ^a   Leskela M ^a  

^a UNIVERSITY OF HELSINKI   (Finland)

Author keywords

Atomic layer deposition; Chemical vapor deposition; Evaporation; Precursor; Thermogravimetry; Vapor pressure

Indexed keywords

CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; EVAPORATION; METALS; PRESSURE MEASUREMENT; SEMICONDUCTOR DEVICE MANUFACTURE; SUBLIMATION; THERMAL EFFECTS; THIN FILMS; VAPOR PRESSURE;

CHEMICAL THIN FILM DEPOSITION; CHEMICAL VAPOR PHASE METHODS; PRECURSOR; VOLATILE METAL COMPOUNDS;

THERMOGRAVIMETRIC ANALYSIS;

EID: 0034901341     PISSN: 14182874     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1011579114687     Document Type: Article

References (10)