Structure, Optical Property and Thermal Stability of Copper Nitride Films Prepared by Reactive Radio Frequency Magnetron Sputtering

Journal of Materials Science and Technology

Volumn 27, Issue 5, 2011, Pages 403-407

  Xiao, Jianrong ^a   Li, Yanwei ^a   Jiang, Aihua ^a  

^a GUILIN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Cu3N films; Decomposition temperature; Optical property; Structure; X ray diffraction

Indexed keywords

ATOMIC FORCE MICROSCOPE IMAGES; COMPACT MORPHOLOGY; COPPER NITRIDE; CRYSTAL DIRECTION; DECOMPOSITION TEMPERATURE; NITROGEN PARTIAL PRESSURES; REACTIVE RADIO-FREQUENCY MAGNETRON SPUTTERING; TYPICAL VALUES; UV-VISIBLE SPECTROMETERS; X-RAY DIFFRACTION TECHNIQUES;

ATOMIC FORCE MICROSCOPY; CRYSTAL ATOMIC STRUCTURE; DIFFRACTION; ENERGY GAP; FILM PREPARATION; METALLIC FILMS; NITRIDES; NITROGEN; OPTICAL BAND GAPS; OPTICAL PROPERTIES; PARTIAL PRESSURE; RADIO; RADIO WAVES; THERMODYNAMIC STABILITY; THERMOGRAVIMETRIC ANALYSIS; X RAY DIFFRACTION;

COPPER;

EID: 79959338938     PISSN: 10050302     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1005-0302(11)60082-0     Document Type: Article

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