La-doped copper nitride films prepared by reactive magnetron sputtering

Journal of Materials Science and Technology

Volumn 25, Issue 2, 2009, Pages 233-236

  Li, Xing'ao ^a,b   Yang, Jianping ^a,b   Zuo, Anyou ^a   Yuan, Zuobin ^a   Liu, Zuli ^c   Yao, Kailun ^c,d  

^a NANJING UNIVERSITY OF POSTS AND TELECOMMUNICATIONS   (China)

^b HUBEI UNIVERSITY FOR NATIONALITIES   (China)

^c HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^d INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

Author keywords

Copper nitride film; Crystal structure; La doped copper nitride films; Magnetron sputtering

Indexed keywords

CONCENTRATION OF; COPPER NITRIDE FILM; FREE FILMS; GLASS SUBSTRATES; HIGH CONCENTRATIONS; LA-DOPED COPPER NITRIDE FILMS; PEAK INTENSITIES; REACTIVE MAGNETRON SPUTTERING;

COPPER; CRYSTAL STRUCTURE; LANTHANUM; MAGNETRON SPUTTERING; MAGNETRONS; METALLIC FILMS; NITRIDES;

FILM PREPARATION;

EID: 64749103310     PISSN: 10050302     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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