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Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 267, Issue 16, 2009, Pages 2653-2656

Electronic and atomic structure modifications of copper nitride films by ion impact and phase separation

(6) Matsunami, N a Kakiuchida, H b Tazawa, M b Sataka, M c Sugai, H c Okayasu, S c

a NAGOYA UNIVERSITY (Japan)

b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST (Japan)

c JAPAN ATOMIC ENERGY AGENCY (Japan)

Author keywords

Cu3N; Decomposition; Ion impact; Phase separation

Indexed keywords

ATOMIC STRUCTURE; COPPER NITRIDE; CU3N; CUBIC STRUCTURE; DIFFRACTION PEAKS; ELECTRICAL RESISTIVITY; FLUENCES; ION IMPACT; MAGNETRON SPUTTER DEPOSITION; OPTICAL ABSORPTION; ORDERS OF MAGNITUDE; POLYCRYSTALLINE; TEMPERATURE DEPENDENCE; THREE ORDERS OF MAGNITUDE; XRD;

ATOMS; DIFFRACTION; ELECTRIC RESISTANCE; ION BOMBARDMENT; IONS; METALLIC FILMS; NEON; NITRIDES; PHASE MODULATION; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; XENON;

PHASE SEPARATION;

EID: 68349160585 PISSN: 0168583X EISSN: None Source Type: Journal
DOI: 10.1016/j.nimb.2009.05.037 Document Type: Article

Times cited : (17)

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