Impact of sampling on uncertainty: Semiconductor dimensional metrology applications

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6922, Issue , 2008, Pages

  Bunday, Benjamin ^a   Rijpers, Bart ^b   Banke, Bill ^c   Archie, Chas ^c   Peterson, Ingrid B ^d   Ukraintsev, Vladimir ^e   Hingst, Thomas ^f   Asano, Masafumi ^g  

^a ISMI   (United States)

^b ASML   (Netherlands)

^c IBM MICROELECTRONICS   (United States)

^d APPLIED MATERIALS INC   (United States)

^e VEECO INSTRUMENTS INC   (United States)

^f QIMONDA DRESDEN GMBH AND CO OHG   (Germany)

^g TOSHIBA CORPORATION   (Japan)

Author keywords

Accuracy; AFM; CD SEM; ITRS; Matching; Metrology; OCD; Sampling; STEM; TEM; Uncertainty

Indexed keywords

ACCURACY; AFM; CD-SEM; ITRS; MATCHING; OCD; STEM; UNCERTAINTY;

ELECTRON BEAMS; QUALITY CONTROL; SAMPLING; STATISTICAL PROCESS CONTROL; UNCERTAINTY ANALYSIS; UNITS OF MEASUREMENT;

MEASUREMENTS;

EID: 79959338895     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772993     Document Type: Conference Paper

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