Sampling plan optimization for CD control in low k1 lithography

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5752, Issue II, 2005, Pages 727-735

  Asano, Masafumi ^a   Koike, Toru ^a   Mikami, Toru ^a   Abe, Hideaki ^a   Ikeda, Takahiro ^a   Tanaka, Satoshi ^a   Mimotogi, Shoji ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

ARC; CD control; CD SEM; Sampling plan; Scatterometry

Indexed keywords

CMOS INTEGRATED CIRCUITS; ERROR ANALYSIS; OPTIMIZATION; PROCESS CONTROL; STATISTICAL METHODS;

CRITICAL DIMENSION ERRORS; DYNAMIC ERRORS; STATISTICAL THEORY;

LITHOGRAPHY;

EID: 24644485283     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600370     Document Type: Conference Paper

References (5)

1. A. B. Wagner, S. M. Ruegsegger, J. S. Freudenberg, and D. S. Grimard, "Interprocess mn-to-run feedforward control for wafer patterning", Proc. 1999 IEEE International Conference on Control Applications, 789-795 (1999).
2. R. Oechsner, T. Tschaftary, S. Sommer, L. Pfitzner, H. Ryssel, H. Gerath, C. Baier, and M. Hafner, "Feed-forward control for a lithography/etch sequence", Proc. SPIE 4182, 31-39 (2000).
3. I. Pollentier, S. Y. Cheng, B. Baudemprez, D. Laidler, Y. van Dommelen, R. Carpaij, J. Yu, J. Uchida, A. Viswanathan, D. Chin, K. Barry, and N. Jakatdar, "In-line lithography cluster monitoring and control using integrated scatterometry", Proc. SPIE 5378, 105-115 (2004).
4. M. Asano, T. Fujisawa, K. Izuha, and S. Inoue, "Run-to-Run CD error analysis and control with monitoring of effective dose and focus", Proc. SPIE 5038, 239-246 (2003).
5. M. Asano, K. Izuha, T. Fujisawa, and S. Inoue, "Effective exposure-dose monitor technique for critical dimension control in optical lithography", J. Microlithogr. Microfabr. Microsyst. 2(1), 129-135 (2003).