Sampling plan optimization for critical dimension metrology

Journal of Microlithography, Microfabrication and Microsystems

Volumn 5, Issue 3, 2006, Pages

  Asano, Masafumi ^a   Ikeda, Takahiro ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

APC; CD control; Confidence interval; Critical dimension; Dynamic error; Sampling plan; Static error

Indexed keywords

ERROR ANALYSIS; MEASUREMENTS; OPTIMIZATION; SAMPLING; STATISTICAL METHODS;

CRITICAL DIMENSION (CD); CRITICAL DIMENSION ERRORS; DYNAMIC ERRORS; SAMPLING PLAN OPTIMIZATION; STATIC ERROR;

PROCESS CONTROL;

EID: 33845438867     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.2242815     Document Type: Article

References (5)

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