SEM-contour based OPC model calibration through the process window

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6518, Issue PART 1, 2007, Pages

  Vasek, Jim ^a   Menedeva, Ovadya ^b   Levitzky, Dan ^b   Lindman, Ofer ^b   Nehmadi, Youval ^b   Bailey, George E ^c   Sturtevant, John L ^c  

^a FREESCALE SEMICONDUCTOR INC   (United States)

^b Applied Materials Inc Israel   (Israel)

^c MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

CD SEM metrology; DBM; Model based OPC; Process window; SEM contour

Indexed keywords

CALIBRATION; ERROR ANALYSIS; MEASUREMENT THEORY; OPTICAL DESIGN; SCANNING ELECTRON MICROSCOPY;

CD-SEM METROLOGY; PROCESS WINDOW; SEM CONTOUR;

PROCESS CONTROL;

EID: 35148846007     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.712232     Document Type: Conference Paper

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