Integrated scatterometry in high volume manufacturing for polysilicon gate etch control

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6152 I, Issue , 2006, Pages

  Sendelbach, Matthew ^a   Munoz, Andres ^a   Bandy, Kenneth A ^a   Prager, Dan ^b   Funk, Merritt ^c  

^a IBM MICROELECTRONICS   (United States)

^b Timbre Technologies Inc   (United States)

^c Tokyo Electron Massachusetts   (United States)

Author keywords

Feedback; Feedforward; Gate; High volume manufacturing; Integrated scatterometry; Polysilicon etch; Scatterometry; TMU; TMU analysis; Total Measurement Uncertainty

Indexed keywords

FEEDFORWARD; GATE; HIGH VOLUME MANUFACTURING; IBM (CO); INTEGRATED SCATTEROMETRY; POLYSILICON ETCH; SCATTEROMETRY; TMU; TMU ANALYSIS; TOTAL MEASUREMENT UNCERTAINTY;

CORRELATION THEORY; ETCHING; FEEDBACK CONTROL; LITHOGRAPHY; MEASUREMENT THEORY; POLYSILICON; SAMPLING; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS;

PROCESS CONTROL;

EID: 33745616070     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.659946     Document Type: Conference Paper

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