Statistical optimization of sampling plan and its relation to OPC model accuracy

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6518, Issue PART 1, 2007, Pages

  Han, Geng ^a   Brendler, Andrew ^a   Mansfield, Scott ^a   Meiring, Jason ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

Analysis of variance (ANOVA); Error budget; OPC model accuracy; Optical proximity correction (OPC); Sampling plan

Indexed keywords

ERROR BUDGET; OPC MODEL ACCURACY; OPTICAL PROXIMITY CORRECTION (OPC); SAMPLING PLAN;

ANALYSIS OF VARIANCE (ANOVA); ERROR ANALYSIS; OPTIMIZATION; SAMPLING;

STATISTICAL PROCESS CONTROL;

EID: 35148845580     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.712725     Document Type: Conference Paper

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