Inline CD metrology with combined use of scatterometry and CD-SEM

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6152 I, Issue , 2006, Pages

  Asano, Masafumi ^a   Ikeda, Takahiro ^a   Koike, Toru ^a   Abe, Hideaki ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

risk; risk; CD SEM; Lot acceptance; OC curve; Sampling plan; Scatterometry

Indexed keywords

COMPUTER SIMULATION; CURVE FITTING; ERROR ANALYSIS; MONTE CARLO METHODS; SCANNING ELECTRON MICROSCOPY; SCATTERING; STATISTICAL METHODS;

CD-SEM; LOT ACCEPTANCE; OC CURVE; SAMPLING PLAN; SCATTEROMETRY;

MEASUREMENTS;

EID: 33745631475     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656326     Document Type: Conference Paper

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