Evaluation of producer's and consumer's risks in scatterometry and scanning electron microscopy metrology for inline critical dimension metrology

Journal of Microlithography, Microfabrication and Microsystems

Volumn 5, Issue 4, 2006, Pages

  Asano, Masafumi ^a   Ikeda, Takahiro ^a   Koike, Toru ^a   Abe, Hideaki ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

CD SEM; Consumer's risk; Lot acceptance; OC curve; Producer's risk; Sampling plan; Scatterometry

Indexed keywords

COMPUTER SIMULATION; ERROR ANALYSIS; MONTE CARLO METHODS; SAMPLING; SCANNING ELECTRON MICROSCOPY; STATISTICAL METHODS;

CONSUMER'S RISK; LOT ACCEPTANCE; PRODUCER'S RISK; SAMPLING PLAN; SCATTEROMETRY;

SPECTROMETRY;

EID: 33947115037     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.2397034     Document Type: Article

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