-
1
-
-
11144248077
-
Flash EEPROM Threshold Instabilities due to Charge Trapping during Program/Erase Cycling
-
N. Mielke, H. Belgal, I. Kalastirsky, P. Kalavade, A. Kurtz, Q. Meng, N. Righos and J. Wu, "Flash EEPROM Threshold Instabilities due to Charge Trapping During Program/Erase Cycling", IEEE Trans. Device and Mat. Rel. 4 (2004) pp 355-344.
-
(2004)
IEEE Trans. Device and Mat. Rel.
, vol.4
, pp. 355-1344
-
-
Mielke, N.1
Belgal, H.2
Kalastirsky, I.3
Kalavade, P.4
Kurtz, A.5
Meng, Q.6
Righos, N.7
Wu, J.8
-
2
-
-
0842309822
-
Reliability Models of Data Retention and Read- Disturb in 2-bit Nitride Storage Flash Memory Cells
-
T. Wang, W.J. Tsai, S.H. Gu, C.T. Chan, C.C. Yeh, N.K. Zous, T.C. Lu, Sam Pan, and C.Y. Lu, "Reliability Models of Data Retention and Read- Disturb in 2-bit Nitride Storage Flash Memory Cells" IEDM Tech Digest (2003) pp. 169-172
-
(2003)
IEDM Tech Digest
, pp. 169-172
-
-
Wang, T.1
Tsai, W.J.2
Gu, S.H.3
Chan, C.T.4
Yeh, C.C.5
Zous, N.K.6
Lu, T.C.7
Pan, S.8
Lu, C.Y.9
-
4
-
-
0032205637
-
Hot hole stress induced leakage current (SILC) transient in tunnel oxides
-
T. Wang, N. K. Zous, J. L. Lai and C. Huang, "Hot hole stress induced leakage current (SILC) transient in tunnel oxides," IEEE Elect. Dev. Lett. 19 (1998) pp. 411-413.
-
(1998)
IEEE Elect. Dev. Lett.
, vol.19
, pp. 411-413
-
-
Wang, T.1
Zous, N.K.2
Lai, J.L.3
Huang, C.4
-
5
-
-
1642587312
-
Lateral charge transport in the nitride layer of the NROM nonvolatile memory device
-
A. Shappir, Y. Shacham-Diamand, E. Lusky, I. Bloom, B. Eitan, "Lateral charge transport in the nitride layer of the NROM nonvolatile memory device" Microelectronic Engineering 72 (2004) pp. 426-433.
-
(2004)
Microelectronic Engineering
, vol.72
, pp. 426-433
-
-
Shappir, A.1
Shacham-Diamand, Y.2
Lusky, E.3
Bloom, I.4
Eitan, B.5
-
6
-
-
77956173215
-
Charge gain, NBTI and Random Telegraph Noise in EEPROM Flash memory devices
-
M. Janai and I. Bloom, "Charge gain, NBTI and Random Telegraph Noise in EEPROM Flash memory devices" IEEE Elect. Device Lett. 31 (2010) pp. 1038-1040.
-
(2010)
IEEE Elect. Device Lett.
, vol.31
, pp. 1038-1040
-
-
Janai, M.1
Bloom, I.2
-
7
-
-
30844464359
-
The NBTI in MOS Devices: A Review
-
J. H. Stathis and S. Zafar, "The NBTI in MOS Devices: a Review", Microelec. Reliab. 46 (2006) 270
-
(2006)
Microelec. Reliab.
, vol.46
, pp. 270
-
-
Stathis, J.H.1
Zafar, S.2
-
9
-
-
77956172644
-
Switching oxide traps as the missing link between negative bias temperature instability and random telegraph noise
-
T. Grasser, H. Reisinger, W. Goes, Th. Aichinger, Ph. Hehenberger, P.J. Wagner, M. Nelhiebel, J. Franco and B. Kaczer "Switching oxide traps as the missing link between negative bias temperature instability and random telegraph noise" IEDM (2009) pp. 729-732.
-
(2009)
IEDM
, pp. 729-732
-
-
Grasser, T.1
Reisinger, H.2
Goes, W.3
Aichinger, Th.4
Hehenberger, Ph.5
Wagner, P.J.6
Nelhiebel, M.7
Franco, J.8
Kaczer, B.9
-
11
-
-
0035714879
-
Data retention behavior of a SONOS type two-bit storage flash memory cell
-
W.J. Tsai, N.K. Zous, C.J. Liu, C.C. Liu, C.H. Chen, T. Wang, S. Pan, C.Y. Lu and S.H. Gu, "Data retention behavior of a SONOS type two-bit storage flash memory cell", IEDM Tech Digest (2001) pp. 719-722.
-
(2001)
IEDM Tech Digest
, pp. 719-722
-
-
Tsai, W.J.1
Zous, N.K.2
Liu, C.J.3
Liu, C.C.4
Chen, C.H.5
Wang, T.6
Pan, S.7
Lu, C.Y.8
Gu, S.H.9
-
12
-
-
12444297623
-
Suppression of erased state Vt drift in two-bit per cell SONOS memories
-
Y. Roizin, E. Pikhay, and M. Gutman, "Suppression of erased state Vt drift in two-bit per cell SONOS memories," IEEE Electron Device Letters, 26 (2005) pp. 35-37.
-
(2005)
IEEE Electron Device Letters
, vol.26
, pp. 35-37
-
-
Roizin, Y.1
Pikhay, E.2
Gutman, M.3
-
13
-
-
11144229439
-
Data retention reliability model of NROM nonvolatile memory products
-
M. Janai, B. Eitan, A. Shappir, E. Lusky, I. Bloom and G. Cohen, "Data retention reliability model of NROM nonvolatile memory products", in IEEE Tran. Device and Materials Rel. 4, (2004) pp. 404-415.
-
(2004)
IEEE Tran. Device and Materials Rel.
, vol.4
, pp. 404-415
-
-
Janai, M.1
Eitan, B.2
Shappir, A.3
Lusky, E.4
Bloom, I.5
Cohen, G.6
-
14
-
-
34547148329
-
A comparison of very fast to very slow components in degradation and recovery due to NBTI and bulk hole trapping to existing physical models
-
H. Reisinger, O. Blank, W. Heinrigs, W. Gustin, and C. Schlünder, "A comparison of very fast to very slow components in degradation and recovery due to NBTI and bulk hole trapping to existing physical models", IEEE Tran. Device and Materials Rel. Vol. 7, No. 1, (2007) pp. 119-129
-
(2007)
IEEE Tran. Device and Materials Rel.
, vol.7
, Issue.1
, pp. 119-129
-
-
Reisinger, H.1
Blank, O.2
Heinrigs, W.3
Gustin, W.4
Schlünder, C.5
-
16
-
-
36549039989
-
Giant RTS in nanoscale floating gate devices
-
P. Fantini, A. Ghetti, A. Arinoni, G. Ghidini, A. Visconti and A. Marmiroli, "Giant RTS in nanoscale floating gate devices", IEEE Elect. Device Lett. 28, 12 (2007) pp. 1114-1116.
-
(2007)
IEEE Elect. Device Lett.
, vol.28
, Issue.12
, pp. 1114-1116
-
-
Fantini, P.1
Ghetti, A.2
Arinoni, A.3
Ghidini, G.4
Visconti, A.5
Marmiroli, A.6
-
18
-
-
2942657319
-
Spatial characterization of localized charge trapping and charge redistribution in the NROM device
-
A. Shappir, D. Levy, Y. Shacham-Diamand, E. Lusky, I. Bloom and B. Eitan, "Spatial characterization of localized charge trapping and charge redistribution in the NROM device", Solid State Electr. 48 (2004) pp. 1489-1495.
-
(2004)
Solid State Electr.
, vol.48
, pp. 1489-1495
-
-
Shappir, A.1
Levy, D.2
Shacham-Diamand, Y.3
Lusky, E.4
Bloom, I.5
Eitan, B.6
-
19
-
-
0012278046
-
Noise in solid-state microstructures: A new perspective on individual defects, interface and low-frequency (1/f) noise
-
M. J. Kirton and M. J. Uren, "Noise in solid-state microstructures: A new perspective on individual defects, interface and low-frequency (1/f) noise", Advances in Physics, 38, no. 4, (1988) pp.367-468.
-
(1988)
Advances in Physics
, vol.38
, Issue.4
, pp. 367-468
-
-
Kirton, M.J.1
Uren, M.J.2
-
20
-
-
69549135114
-
A new NBTI model based on hole trapping and structural relaxation in MOS dielectrics
-
D. Ielmini, M. Manigrasso, F. Gattel and M.C. Valentini, "A new NBTI model based on hole trapping and structural relaxation in MOS dielectrics", IEEE Trans. Electron Devices 56, 9 (2009) pp. 1943-1952.
-
(2009)
IEEE Trans. Electron Devices
, vol.56
, Issue.9
, pp. 1943-1952
-
-
Ielmini, D.1
Manigrasso, M.2
Gattel, F.3
Valentini, M.C.4
-
21
-
-
40549121324
-
Defect-generation in p-MOSFETs under negative-bias stress: An experimental perspective
-
S. Mahapatra and M. A. Alam, "Defect-generation in p-MOSFETs under negative-bias stress: An experimental perspective," IEEE Trans. Device Mater. Rel. 8, 1 (2008) pp. 35-46.
-
(2008)
IEEE Trans. Device Mater. Rel.
, vol.8
, Issue.1
, pp. 35-46
-
-
Mahapatra, S.1
Alam, M.A.2
-
22
-
-
0020918475
-
Tunneling discharge of trapped holes in silicon dioxide
-
Edit. J.F. Verweji and D.R. Wolters, Elsevier Science Pub. B.V. North-Holland
-
S. Manzini and A. Modelli, "Tunneling discharge of trapped holes in silicon dioxide", in Insulating Films on Semiconductors, Edit. J.F. Verweji and D.R. Wolters, (Elsevier Science Pub. B.V. North-Holland 1983) pp 112-115.
-
(1983)
Insulating Films on Semiconductors
, pp. 112-115
-
-
Manzini, S.1
Modelli, A.2
|