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Volumn 31, Issue 9, 2010, Pages 1038-1040

Charge Gain, NBTI, and random telegraph noise in EEPROM flash memory devices

Author keywords

EEPROM; Flash memory; negative bias temperature instability (NBTI); nonvolatile memory (NVM); NROM; random telegraph noise (RTN)

Indexed keywords

EEPROM; NEGATIVE BIAS TEMPERATURE INSTABILITY; NONVOLATILE MEMORY (NVM); NROM; RANDOM TELEGRAPH NOISE;

EID: 77956173215     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2010.2058088     Document Type: Article
Times cited : (8)

References (16)
  • 3
    • 0842309822 scopus 로고    scopus 로고
    • Reliability models of data retention and read-disturb in 2-bit nitride storage Flash memory cells
    • T. Wang, W. J. Tsai, S. H. Gu, C. T. Chan, C. C. Yeh, N. K. Zous, T. C. Lu, S. Pan, and C. Y. Lu, "Reliability models of data retention and read-disturb in 2-bit nitride storage Flash memory cells," in IEDM Tech. Dig., 2003, pp. 169-172.
    • (2003) IEDM Tech. Dig. , pp. 169-172
    • Wang, T.1    Tsai, W.J.2    Gu, S.H.3    Chan, C.T.4    Yeh, C.C.5    Zous, N.K.6    Lu, T.C.7    Pan, S.8    Lu, C.Y.9
  • 4
    • 1642587312 scopus 로고    scopus 로고
    • Lateral charge transport in the nitride layer of the NROM non-volatile memory device
    • Apr.
    • A. Shappir, Y. Shacham-Diamand, E. Lusky, I. Bloom, and B. Eitan, "Lateral charge transport in the nitride layer of the NROM non-volatile memory device," Microelectron. Eng., vol.72, no.1-4, pp. 426-433, Apr. 2004.
    • (2004) Microelectron. Eng. , vol.72 , Issue.1-4 , pp. 426-433
    • Shappir, A.1    Shacham-Diamand, Y.2    Lusky, E.3    Bloom, I.4    Eitan, B.5
  • 5
    • 28744450020 scopus 로고    scopus 로고
    • The kinetics of degradation of data retention of post-cycled NROM non-volatile memory products
    • M. Janai and B. Eitan, "The kinetics of degradation of data retention of post-cycled NROM non-volatile memory products," in Proc. 43rd IEEE Int. Rel. Phys. Symp., 2005, pp. 175-180.
    • (2005) Proc. 43rd IEEE Int. Rel. Phys. Symp. , pp. 175-180
    • Janai, M.1    Eitan, B.2
  • 7
    • 12444297623 scopus 로고    scopus 로고
    • Suppression of erased state v t drift in two-bit per cell SONOS memories
    • Jan.
    • Y. Roizin, E. Pikhay, and M. Gutman, "Suppression of erased state V t drift in two-bit per cell SONOS memories," IEEE Electron Device Lett., vol.26, no.1, pp. 35-37, Jan. 2005.
    • (2005) IEEE Electron Device Lett. , vol.26 , Issue.1 , pp. 35-37
    • Roizin, Y.1    Pikhay, E.2    Gutman, M.3
  • 10
    • 30844464359 scopus 로고    scopus 로고
    • The NBTI in MOS devices: A review
    • Feb.-Apr.
    • J. H. Stathis and S. Zafar, "The NBTI in MOS devices: A review," Micro-electron. Reliab., vol.46, no.2-4, pp. 270-286, Feb.-Apr. 2006.
    • (2006) Micro-electron. Reliab. , vol.46 , Issue.2-4 , pp. 270-286
    • Stathis, J.H.1    Zafar, S.2
  • 11
    • 2942657319 scopus 로고    scopus 로고
    • Spatial characterization of localized charge trapping and charge redistribution in the NROM device
    • Sep.
    • A. Shappir, D. Levy, Y. Shacham-Diamand, E. Lusky, I. Bloom, and B. Eitan, "Spatial characterization of localized charge trapping and charge redistribution in the NROM device," Solid State Electron., vol.48, no.9, pp. 1489-1495, Sep. 2004.
    • (2004) Solid State Electron. , vol.48 , Issue.9 , pp. 1489-1495
    • Shappir, A.1    Levy, D.2    Shacham-Diamand, Y.3    Lusky, E.4    Bloom, I.5    Eitan, B.6
  • 12
    • 35949025938 scopus 로고
    • Discrete resistance switching in submicrometer silicon inversion layers: Individual interface traps and low-frequency noise
    • K. S. Ralls, W. J. Skocpol, L. D. Jackel, R. E. Howard, L. A. Fetter, R. W. Epworth, and D. M. Tennant, "Discrete resistance switching in submicrometer silicon inversion layers: Individual interface traps and low-frequency noise," Phys. Rev. Lett., vol.52, no.3, pp. 228-231, 1984.
    • (1984) Phys. Rev. Lett. , vol.52 , Issue.3 , pp. 228-231
    • Ralls, K.S.1    Skocpol, W.J.2    Jackel, L.D.3    Howard, R.E.4    Fetter, L.A.5    Epworth, R.W.6    Tennant, D.M.7
  • 13
    • 77951058313 scopus 로고    scopus 로고
    • A study of NBTI by the statistical analysis of the properties of individual defects in pMOSFETS
    • H. Reisinger, T. Grasser, and C. Schlünder, "A study of NBTI by the statistical analysis of the properties of individual defects in pMOSFETS," in Proc. IEEE Int. Rel. Workshop, 2009, pp. 30-35.
    • (2009) Proc. IEEE Int. Rel. Workshop , pp. 30-35
    • Reisinger, H.1    Grasser, T.2    Schlünder, C.3
  • 15
    • 0020918475 scopus 로고
    • Tunneling discharge of trapped holes in silicon dioxide
    • J. F. Verweji and D. R. Wolters, Eds. Amsterdam, The Netherlands: Elsevier
    • S. Manzini and A. Modelli, "Tunneling discharge of trapped holes in silicon dioxide," in Insulating Films on Semiconductors, J. F. Verweji and D. R. Wolters, Eds. Amsterdam, The Netherlands: Elsevier, 1983, pp. 112-115.
    • (1983) Insulating Films on Semiconductors , pp. 112-115
    • Manzini, S.1    Modelli, A.2
  • 16
    • 34547148329 scopus 로고    scopus 로고
    • A comparison of very fast to very slow components in degradation and recovery due to NBTI and bulk hole trapping to existing physical models
    • Mar.
    • H. Reisinger, O. Blank, W. Heinrigs, W. Gustin, and C. Schlünder, "A comparison of very fast to very slow components in degradation and recovery due to NBTI and bulk hole trapping to existing physical models," IEEE Trans. Device Mater. Rel., vol.7, no.1, pp. 119-129, Mar. 2007.
    • (2007) IEEE Trans. Device Mater. Rel. , vol.7 , Issue.1 , pp. 119-129
    • Reisinger, H.1    Blank, O.2    Heinrigs, W.3    Gustin, W.4    Schlünder, C.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.