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Volumn 406, Issue 15-16, 2011, Pages 3030-3035
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Improved electrical parameters of vacuum annealed Ni/4H-SiC (0001) Schottky barrier diode
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Author keywords
4HSiC; Electrical parameters; Schottky diode; Vacuum annealing
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Indexed keywords
4H-SIC SUBSTRATE;
4HSIC;
BAND GAPS;
CAPACITANCE VOLTAGE;
CURRENT VOLTAGE;
DENSITY OF INTERFACE STATE;
DISCRETE ENERGY LEVELS;
ELECTRICAL PARAMETER;
GAS AMBIENTS;
IDEALITY FACTORS;
INTERFACE STATES DENSITY;
MILD TEMPERATURES;
MINORITY CARRIER GENERATION;
REVERSE LEAKAGE CURRENT;
REVERSE VOLTAGES;
SCHOTTKY BARRIER HEIGHTS;
SCHOTTKY DIODES;
SIC(0 0 0 1);
VACUUM ANNEALING;
ANNEALING;
DIODES;
SEMICONDUCTING SILICON COMPOUNDS;
SILICON CARBIDE;
VACUUM;
VACUUM TECHNOLOGY;
SCHOTTKY BARRIER DIODES;
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EID: 79957998861
PISSN: 09214526
EISSN: None
Source Type: Journal
DOI: 10.1016/j.physb.2011.05.001 Document Type: Article |
Times cited : (37)
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References (32)
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