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Volumn 406, Issue 15-16, 2011, Pages 3030-3035

Improved electrical parameters of vacuum annealed Ni/4H-SiC (0001) Schottky barrier diode

Author keywords

4HSiC; Electrical parameters; Schottky diode; Vacuum annealing

Indexed keywords

4H-SIC SUBSTRATE; 4HSIC; BAND GAPS; CAPACITANCE VOLTAGE; CURRENT VOLTAGE; DENSITY OF INTERFACE STATE; DISCRETE ENERGY LEVELS; ELECTRICAL PARAMETER; GAS AMBIENTS; IDEALITY FACTORS; INTERFACE STATES DENSITY; MILD TEMPERATURES; MINORITY CARRIER GENERATION; REVERSE LEAKAGE CURRENT; REVERSE VOLTAGES; SCHOTTKY BARRIER HEIGHTS; SCHOTTKY DIODES; SIC(0 0 0 1); VACUUM ANNEALING;

EID: 79957998861     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physb.2011.05.001     Document Type: Article
Times cited : (37)

References (32)
  • 24
    • 79958011708 scopus 로고    scopus 로고
    • http://www.ioffe.rssi.ru/SVA/NSM/Semicond/SiC/bandstr.html


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.