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Volumn 519, Issue 15, 2011, Pages 4923-4927
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Effect of bias voltage on microstructure, mechanical and wear properties of Al-Si-N coatings deposited by cathodic arc evaporation
a
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Author keywords
Al Si N coating; Bias voltage; Cathodic arc evaporation; Friction coefficient; Hardness
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Indexed keywords
ADHESIVE STRENGTH;
AL-SI-N COATING;
ALLOY TARGET;
ALN FILMS;
AMORPHOUS SI;
ARC EVAPORATION;
AS-DEPOSITED FILMS;
CATHODIC ARC EVAPORATION;
COEFFICIENT OF FRICTIONS;
CONSTANT FLOW;
DUAL CATHODES;
FREE SI;
FRICTION COEFFICIENTS;
GRAIN SIZE;
MAXIMUM HARDNESS;
NANO-COMPOSITE STRUCTURE;
NANOCRYSTALLINES;
PREFERRED ORIENTATIONS;
SILICON WAFER SUBSTRATES;
SUBSTRATE BIAS;
TOP COATING;
VARIOUS SUBSTRATES;
WEAR PROPERTIES;
WEAR TEST;
XRD;
ALUMINUM;
AMORPHOUS SILICON;
CATHODES;
CHROMATE COATINGS;
EVAPORATION;
FRICTION;
HARDNESS;
METALLIC FILMS;
MICROSTRUCTURE;
NANOCOMPOSITES;
PHASE TRANSITIONS;
SEMICONDUCTING SILICON COMPOUNDS;
SILICON;
SILICON ALLOYS;
SILICON WAFERS;
SUBSTRATES;
TUNGSTEN;
TUNGSTEN CARBIDE;
WEAR OF MATERIALS;
BIAS VOLTAGE;
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EID: 79957642143
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2011.01.054 Document Type: Conference Paper |
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Times cited : (33)
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References (29)
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