SiO2 film deposition on the inner wall of a narrow polymer tube by a capacitively coupled μplasma

Thin Solid Films

Volumn 518, Issue 13, 2010, Pages 3526-3530

  Yoshiki, Hiroyuki ^a   Mitsui, Toshiaki ^b   Sato, Takaya ^a   Morinaga, Takashi ^a   Marukane, Shoko ^a  

^a TSURUOKA NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

^b YAMAGATA RESEARCH INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

plasma; High pressure plasma; Plasma processing and deposition; Poly(propylene) tube; SiO2 films

Indexed keywords

CAPACITIVELY COUPLED; CAPACITIVELY COUPLED DISCHARGES; CARRIER GAS; FILM DEPOSITION; HIGH PRESSURE; HIGH PRESSURE PLASMA; INFRARED SPECTRUM; INNER SURFACES; INNER WALLS; PLASMA PROCESSING AND DEPOSITION; POLYMER TUBES; RADIO FREQUENCIES; RF-POWER; ROOM TEMPERATURE; SCANNING ELECTRON MICROSCOPY IMAGE; SMOOTH SURFACE; TETRAETHOXYSILANES; X RAY PHOTOELECTRON SPECTRA;

ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; ELECTRIC DISCHARGES; INFRARED SPECTROSCOPY; MICROELECTROMECHANICAL DEVICES; PLASMA DEVICES; PLASMAS; PROPYLENE; SCANNING ELECTRON MICROSCOPY; SILICON COMPOUNDS; TUBES (COMPONENTS); X RAY PHOTOELECTRON SPECTROSCOPY;

PLASMA DEPOSITION;

EID: 77949436567     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.11.047     Document Type: Article

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