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Materials Science and Engineering: B

Volumn 135, Issue 1, 2006, Pages 1-9

Superhard nanocomposite Ti-Al-Si-N films deposited by reactive unbalanced magnetron sputtering

(5) Jiang, Ning a Shen, Y G b Zhang, H J c Bao, S N c Hou, X Y a

a FUDAN UNIVERSITY (China)

b CITY UNIVERSITY OF HONG KONG (Hong Kong)

c ZHEJIANG UNIVERSITY (China)

Author keywords

Bonding; Hardening mechanism; Roughness; Stress; Superhard nanocomposite films; Ti Al Si N

Indexed keywords

COMPOSITION; DEPOSITION; ENERGY DISPERSIVE SPECTROSCOPY; HARDENING; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; STRESS ANALYSIS; SUBSTRATES; SURFACE ROUGHNESS; TITANIUM COMPOUNDS;

BONDING STRUCTURE; MANIOC; REACTIVE UNBALANCED MAGNETRON SPUTTERING; TI-AL-SI-N;

THIN FILMS;

EID: 33750343557 PISSN: 09215107 EISSN: None Source Type: Journal
DOI: 10.1016/j.mseb.2006.06.043 Document Type: Article

Times cited : (99)

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