Properties of magnetron sputtered Al-Si-N thin films with a low and high Si content

Surface and Coatings Technology

Volumn 202, Issue 15, 2008, Pages 3485-3493

  Musil, J ^a   Sasek M ^a   Zeman, P ^a   Cerstvy R ^a   Herman D ^a   Han, J G ^b   Satava V ^a  

^a UNIVERSITY OF WEST BOHEMIA   (Czech Republic)

^b Sungkyunkwan University   (South Korea)

Author keywords

Al Si N films; Mechanical properties; Oxidation resistance; Reactive magnetron sputtering; Structure; Thermal annealing

Indexed keywords

ANNEALING; HARDNESS; MAGNETRON SPUTTERING; MECHANICAL PROPERTIES; OXIDATION RESISTANCE; REACTIVE SPUTTERING; THERMODYNAMIC STABILITY; THIN FILMS;

REACTIVE MAGNETRON SPUTTERING;

METALLIC FILMS;

ANNEALING; HARDNESS; MAGNETRON SPUTTERING; MECHANICAL PROPERTIES; METALLIC FILMS; OXIDATION RESISTANCE; REACTIVE SPUTTERING; THERMODYNAMIC STABILITY; THIN FILMS;

EID: 40949087669     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2007.12.024     Document Type: Article

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