Characterization of (Al, Si)N films deposited by balanced magnetron sputtering

Thin Solid Films

Volumn 517, Issue 21, 2009, Pages 5988-5993

  Liu, H ^a   Tang, W ^a   Hui, D ^a   Hei, L ^a   Lu, F ^a  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING   (China)

Author keywords

Hardness; Magnetron sputtering; Nanocomposite film; Optical transmittance; Scanning electron microscopy

Indexed keywords

AMORPHOUS STATE; MAXIMUM HARDNESS; MICROSTRUCTURE AND PROPERTIES; MID-INFRARED REGIONS; NANOCOMPOSITE FILM; NANOCRYSTALLINE; NO ABSORPTION; OPTICAL APPLICATIONS; OPTICAL TRANSMITTANCE; SI CONTENT; TRANSPARENT NANOCOMPOSITES; UNBALANCED MAGNETRON SPUTTERING;

ALUMINUM; AMORPHOUS FILMS; FILM PREPARATION; HARDNESS; INTEGRATED OPTOELECTRONICS; MAGNETRON SPUTTERING; MAGNETRONS; METALLIC FILMS; MICROCRYSTALLINE SILICON; MICROSTRUCTURE; NANOCOMPOSITES; OPACITY; OPTICAL MICROSCOPY; SCANNING; SCANNING ELECTRON MICROSCOPY; SILICON;

OPTICAL FILMS;

EID: 67249159229     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.03.173     Document Type: Article

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