The interfacial properties of MgCl 2 films grown on a flat SiO 2 /Si substrate. An XPS and ISS study

Applied Surface Science

Volumn 255, Issue 21, 2009, Pages 8941-8946

  Karakalos, S ^a,b   Siokou, A ^a   Ladas, S ^a,b  

^a INSTITUTE OF COMPUTER SCIENCE   (Greece)

^b UNIVERSITY OF PATRAS   (Greece)

Author keywords

Contact potential difference; Ion scattering spectroscopy; Magnesium halide; Photoelectron spectroscopy; Silicon oxide; Ziegler Natta

Indexed keywords

ATOMS; CHLORINE; CHLORINE COMPOUNDS; PHOTOELECTRON SPECTROSCOPY; PHOTOELECTRONS; PHOTONS; PLASMA INTERACTIONS; SILICA; SILICON OXIDES; SILICON WAFERS; SUBSTRATES; X RAY PHOTOELECTRON SPECTROSCOPY;

CONTACT POTENTIAL DIFFERENCE; INTERFACIAL INTERACTION; INTERFACIAL LAYER; INTERFACIAL PROPERTY; ION SCATTERING SPECTROSCOPY; MAGNESIUM CHLORIDES; MAGNESIUM HALIDES; ZIEGLER-NATTA;

MAGNESIUM COMPOUNDS;

EID: 67749101438     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2009.06.105     Document Type: Article

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