The properties of nanocomposite aluminium-silicon based thin films deposited by filtered arc deposition

Thin Solid Films

Volumn 420-421, Issue , 2002, Pages 83-88

  Bendavid, Avi ^a   Martin, P J ^a   Takikawa, H ^b  

^a CSIRO   (Australia)

^b TOYOHASHI UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

Aluminium; Filtered arc deposition; Nanocomposite; Nitride; Optical properties; Oxides; Silicon; Structure and mechanical properties

Indexed keywords

ALUMINUM; CRYSTAL STRUCTURE; DEPOSITION; ELLIPSOMETRY; NANOSTRUCTURED MATERIALS; REFRACTIVE INDEX; SILICON; SPECTROSCOPY; STRESS ANALYSIS; X RAY DIFFRACTION;

FILTERED ARC DEPOSITION;

THIN FILMS;

EID: 0037011172     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00660-0     Document Type: Conference Paper

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