Preparation and microstructure properties of Al-doped TiO2-SiO2 gel-glass film

Thin Solid Films

Volumn 515, Issue 4, 2006, Pages 2055-2058

  Wang, Minqiang ^a   Gong, Bin ^b   Yao, Xi ^a   Wang, Yunpeng ^a   Lamb, Robert N ^b  

^a BEIJING UNIVERSITY OF POSTS AND TELECOMMUNICATIONS   (China)

^b UNIVERSITY OF NEW SOUTH WALES   (Australia)

Author keywords

AFM; Al doped; TiO2 SiO2 gel glass film; XPS

Indexed keywords

ALUMINUM; ATOMIC FORCE MICROSCOPY; DOPING (ADDITIVES); GLASS; HYDROLYSIS; MICROSTRUCTURE; MULTILAYERS; SILICON WAFERS; SPIN COATING; X RAY PHOTOELECTRON SPECTROSCOPY;

ELEMENTAL COMPOSITION; GLASS FILMS; MULTI-LAYER SPIN COATING;

TITANIUM COMPOUNDS;

EID: 33750821437     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.05.018     Document Type: Article

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