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Volumn 509, Issue 21, 2011, Pages 6242-6246

Preparation and characterisation of PZT films by RF-magnetron sputtering

(7) Frunza, Raluca a Ricinschi, Dan b,c Gheorghiu, Felicia d Apetrei, Radu d Luca, Dumitru d Mitoseriu, Liliana d Okuyama, Masanori b

a JO EF STEFAN INSTITUTE (Slovenia)

b OSAKA UNIVERSITY (Japan)

c TOKYO INSTITUTE OF TECHNOLOGY (Japan)

d ALEXANDRU IOAN CUZA UNIVERSITY OF IASI (Romania)

Author keywords

P(E) loops; PbZrxTi1 xO3films; PFM; RF magnetron sputtering

Indexed keywords

CERAMIC TARGET; CHARACTERISATION; DOMAIN NUCLEATION; FERROELECTRIC CHARACTERISTICS; IMPEDANCE SPECTROSCOPY; LOW LOSS; NANO SCALE; P(E) LOOPS; PBZRXTI1-XO3FILMS; PFM; PIEZORESPONSE FORCE MICROSCOPY; POSTDEPOSITION HEAT TREATMENT; PZT; PZT FILM; RF-MAGNETRON SPUTTERING; SEM-EDX; STOICHIOMETRIC FILMS; SUBSTRATE HOLDERS; SWITCHING MECHANISM;

DIELECTRIC PROPERTIES; LEAD; MAGNETRON SPUTTERING; PEROVSKITE; SUBSTRATES; ZIRCONIUM;

FILM PREPARATION;

EID: 79955620756 PISSN: 09258388 EISSN: None Source Type: Journal
DOI: 10.1016/j.jallcom.2011.03.021 Document Type: Article

Times cited : (26)

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