Leakage behavior and distortion of the hysteresis loop in ferroelectric thin films

Science in China, Series E: Technological Sciences

Volumn 40, Issue 2, 1997, Pages 126-134

  Zheng, Lirong ^a   Lin, Chenglu ^a   Xu, Huaping ^a   Zou, Shichang ^a   Okuyama, Masanori ^b  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

^b OSAKA UNIVERSITY   (Japan)

Author keywords

Ferroelectric thin film; Hysteresis loop; Leakage; Schottky barrier

Indexed keywords

EID: 0346477724     PISSN: 10069321     EISSN: None     Source Type: Journal    
DOI: 10.1007/bf02916944     Document Type: Article

References (15)

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