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Volumn 371, Issue 1, 2000, Pages 264-271
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Formation of hillocks in Pt/Ti electrodes and their effects on short phenomena of PZT films deposited by reactive sputtering
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Author keywords
[No Author keywords available]
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Indexed keywords
ANNEALING;
ELECTROCHEMICAL ELECTRODES;
FERROELECTRIC MATERIALS;
GRAIN BOUNDARIES;
LEAD COMPOUNDS;
OXIDATION;
PARTIAL PRESSURE;
SPUTTER DEPOSITION;
THIN FILMS;
HILLOCKS;
DIELECTRIC FILMS;
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EID: 0033703994
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(00)00970-6 Document Type: Article |
Times cited : (65)
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References (16)
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