Chemical vapour deposition enhanced by atmospheric microwave plasmas: A large-scale industrial process or the next nanomanufacturing tool?

Plasma Sources Science and Technology

Volumn 20, Issue 2, 2011, Pages

  Belmonte, T ^a   Gries, T ^a   Cardoso, R P ^a   Arnoult, G ^a   Kosior, F ^a   Henrion, G ^a  

^a INSTITUT JEAN LAMOUR   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC MICROWAVE PLASMA; ATMOSPHERIC PLASMA DEPOSITION; CHEMICAL VAPOUR DEPOSITION; HEXAGONAL CELLS; HIGH DEPOSITION RATES; HIGH TEMPERATURE; HIGH-CONTENT; LARGE-SCALE INDUSTRIAL PROCESS; MICROWAVE RESONANT CAVITIES; NANO-MANUFACTURING; NANODOTS; NANOMETRES; PATTERNED SURFACE; SCALING DOWN; SELF-ORGANIZATIONS;

ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; DEPOSITION; SILICON COMPOUNDS;

PLASMA DEPOSITION;

EID: 79953708797     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/20/2/024004     Document Type: Article

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